The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 08, 2018
Filed:
Jan. 28, 2014
Georgetown University, Washington, DC (US);
Kaveh Jorabchi, Arlington, VA (US);
Haopeng Wang, Ellicott City, MD (US);
Georgetown University, Washington, DC (US);
Abstract
Plasma-assisted reaction chemical ionization (PARCI) provides highly sensitive elemental analysis by producing positively and negatively charged ions. The PARCI apparatuses, kits, and methods described in this application relate to systems that comprise a chemical reaction interface (CRI) containing reactant gas plasma and an ionization chamber that is downstream from the CRI. The ionization chamber facilitates formation of ions from element-specific products of the CRI by an electron source or an ionization gas. In particular, PARCI provides a method for conducting highly sensitive mass spectrometric elemental analysis of analyte compounds with high ionization potential elements; for example, fluorine, chlorine, and bromine.