The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 08, 2018
Filed:
Feb. 24, 2016
Applicant:
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Inventors:
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06T 7/00 (2017.01); G06K 9/46 (2006.01); G06T 7/11 (2017.01); G06T 7/12 (2017.01); G06T 7/155 (2017.01); G06K 9/68 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
G06T 7/001 (2013.01); G06K 9/4604 (2013.01); G06K 9/685 (2013.01); G06T 7/11 (2017.01); G06T 7/12 (2017.01); G06T 7/155 (2017.01); G06K 2209/19 (2013.01); G06T 2207/10061 (2013.01); G06T 2207/30148 (2013.01); G06T 2207/30172 (2013.01); H01L 22/12 (2013.01);
Abstract
The inventive concepts provide a method for inspecting a pattern, a method for manufacturing a semiconductor device, and an apparatus used according to the methods. The method for inspecting a pattern includes detecting a measured image corresponding to a pattern formed on a substrate, detecting a first hot spot corresponding to a ghost image of the measured image, with the first hot spot representing a defect of the pattern, and detecting a second hot spot that has an area that is wider than that of the first hot spot.