The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 08, 2018

Filed:

Apr. 04, 2016
Applicant:

Coventor, Inc., Cary, NC (US);

Inventors:

Mattan Kamon, Concord, MA (US);

Kenneth B. Greiner, Arlington, MA (US);

David M. Fried, South Salem, NY (US);

Assignee:

Coventor, Inc., Cary, NC (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G05B 19/00 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G06F 17/5068 (2013.01); G03F 7/0002 (2013.01); G05B 19/00 (2013.01); G06F 2217/84 (2013.01);
Abstract

The modeling of a DSA step within a virtual fabrication process sequence for a semiconductor device structure is discussed. A 3D model is created by the virtual fabrication that represents and depicts the possible variation that can result from applying the DSA step as part of the larger fabrication sequence for the semiconductor device structure of interest. Embodiments capture the relevant behavior caused by polymer segregation into separate domains thereby allowing the modeling of the DSA step to take place with a speed appropriate for a virtual fabrication flow.


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