The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 08, 2018

Filed:

Feb. 26, 2015
Applicant:

V Technology Co., Ltd., Kanagawa, JP;

Inventors:

Koichi Kajiyama, Kanagawa, JP;

Shin Ishikawa, Kanagawa, JP;

Takayuki Sato, Kanagawa, JP;

Kazushige Hashimoto, Kanagawa, JP;

Assignee:

V TECHNOLOGY CO., LTD., Kanagawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01); G03F 7/20 (2006.01); B41J 2/447 (2006.01); G03G 15/04 (2006.01); B41J 2/47 (2006.01);
U.S. Cl.
CPC ...
G03F 7/7015 (2013.01); B41J 2/447 (2013.01); B41J 2/47 (2013.01); G03F 7/2057 (2013.01); G03F 7/704 (2013.01); G03F 7/70391 (2013.01); G03G 15/04054 (2013.01);
Abstract

A beam exposure device includes a light-emitting unit for emitting light beams from a plurality of light-emitting positions, a scan unit, an optical condensing system for condensing a spot of the light beams onto a surface to be exposed, and a micro-deflection unit for micro-deflecting the plurality of light beams to expose the space between the beams in the plurality of light beams. The optical condensing system includes a first microlens array arranged between the light-emitting unit and the micro-deflection unit and provided with a plurality of microlenses corresponding to the light-emitting positions; and a second microlens array arranged between the micro-deflection unit and the surface to be exposed and provided with a plurality of microlenses each microlens corresponding to the light-emitting unit.


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