The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 08, 2018

Filed:

Sep. 19, 2014
Applicant:

Apple Inc., Cupertino, CA (US);

Inventors:

Byung Duk Yang, Cupertino, CA (US);

Kyung-Wook Kim, Cupertino, CA (US);

Shih-Chang Chang, Cupertino, CA (US);

Hiroshi Osawa, Sunnyvale, CA (US);

John Z. Zhong, Cupertino, CA (US);

Assignee:

Apple Inc., Cupertino, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1335 (2006.01); G02F 1/1362 (2006.01); G02F 1/1333 (2006.01);
U.S. Cl.
CPC ...
G02F 1/136209 (2013.01); G02F 2001/133357 (2013.01); G02F 2001/136222 (2013.01);
Abstract

A display may have a thin-film transistor layer and a color filter layer. The display may include light blocking structures formed on a transparent substrate. In one arrangement, a clear planarization layer may be formed over the light blocking structures. The thin-film transistor layer may be formed over the planarization layer. The color filter layer may be integrated with the thin-film transistor layer. At least light blocking structures and the planarization layer should be formed from high temperature resistance material. In another arrangement, the color filter layer may be formed on the light blocking structures. A clear planarization layer may then be formed over the color filter layer. The thin-film transistor layer may be formed on the planarization layer. In this arrangement, the color filter layer also needs to be formed from thermal resistance material.


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