The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 08, 2018

Filed:

May. 28, 2015
Applicant:

Dic Corporation, Tokyo, JP;

Inventors:

Tomoyuki Imada, Ichihara, JP;

Seiji Kimoto, Ichihara, JP;

Shigenobu Kida, Ichihara, JP;

Assignee:

DIC Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 8/04 (2006.01); C09D 161/06 (2006.01); G03F 7/039 (2006.01); G03F 7/11 (2006.01);
U.S. Cl.
CPC ...
C08G 8/04 (2013.01); C09D 161/06 (2013.01); G03F 7/039 (2013.01); G03F 7/11 (2013.01);
Abstract

Disclosed are a phenolic hydroxyl group-containing resin which has excellent alkali developing properties and makes it possible to exhibit high heat resistance in a cured product obtained therefrom, a production method therefor, a photosensitive composition, a resist material, a coating film, a curable composition and a cured product thereof, and a resist underlayer film. A phenolic hydroxyl group-containing resin, including a compound (A) having a molecular structure represented by the following Structural Formula (1). (In the formula, Rrepresents an alkyl group, an alkoxy group, or an aryl group, Rrepresents a hydrogen atom, an alkyl group, or an aryl group, m is an integer of 1 to 3, and n is an integer of 2 to 15. In the case where m is 2 or more, plural R's may be the same as or different from each other.)


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