The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 08, 2018
Filed:
Mar. 20, 2015
Applicant:
Fina Technology, Inc., Houston, TX (US);
Inventors:
John Tomlinson, Prairieville, LA (US);
Jose Sosa, Deer Park, TX (US);
Assignee:
FINA TECHNOLOGY, INC., Houston, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 279/02 (2006.01); C08L 51/04 (2006.01); C08F 2/00 (2006.01); C08F 2/38 (2006.01);
U.S. Cl.
CPC ...
C08F 279/02 (2013.01); C08F 2/00 (2013.01); C08F 2/001 (2013.01); C08F 2/38 (2013.01); C08L 51/04 (2013.01);
Abstract
A process for producing a high impact polystyrene having a high swell index may include feeding at least one vinyl aromatic monomer and at least one elastomer to at least one polymerization reactor to form a reaction mixture. The process may include polymerizing the reaction mixture, combining a chain transfer agent to the reaction mixture leaving the at least one polymerization reactor to form a combined mixture, and sending the combined mixture to a devolatilization zone. The process may include obtaining a HIPS product having a high swell index.