The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 08, 2018
Filed:
Jun. 19, 2015
V Technology Co., Ltd., Kanagawa, JP;
V TECHNOLOGY CO., LTD., , JP;
Abstract
The invention provides a method for producing a deposition mask that includes forming of an opening patternat a predetermined position in a resin filmby laser processing so as to penetrate therethrough. The method including the steps of: forming a meniscus of a liquid filmbetween the resin filmand a smooth surfaceof a reference substratesupporting the resin film; and after the resin filmand the reference substrateare brought into close contact with an adsorption force generated by Laplace pressure, forming the opening patternby performing the laser processing. Accordingly, it is possible to increase the speed of the laser processing without generating a burr on an edge portion of the opening pattern.