The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 08, 2018

Filed:

May. 27, 2014
Applicant:

Lg Chem, Ltd., Seoul, KR;

Inventors:

WonChan Park, Daejeon, KR;

De-Hee Kim, Daejeon, KR;

Ye-Hoon Im, Daejeon, KR;

Assignee:

LG CHEM, LTD., Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05C 3/02 (2006.01); B05C 3/132 (2006.01); H01M 2/14 (2006.01);
U.S. Cl.
CPC ...
B05C 3/02 (2013.01); B05C 3/132 (2013.01); H01M 2/145 (2013.01);
Abstract

A dipping bath according to the present disclosure includes a body to hold a slurry for dip coating, an inlet installed to flow the slurry from an outside of the body to an inside, and an outlet installed to discharge the slurry from the inside of the body to the outside, and one end of the inlet placed inside the body may be disposed facing a side surface of the body at a distance and may be tilted to a predetermined angle in a direction toward a bottom surface of the body. According to the present disclosure, adjustment of an incidence angle of the slurry flowing into the bath through the inlet may increase a flow rate of the slurry toward the bottom surface, as well as allowing a uniform distribution of solids contained in the slurry circulating through the bath.


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