The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 08, 2018
Filed:
Sep. 04, 2012
Makoto Ikegami, Tokyo, JP;
Takanori Matsumoto, Tokyo, JP;
Tsuruo Nakayama, Tokyo, JP;
Youhei Jikihara, Tokyo, JP;
Makoto Ikegami, Tokyo, JP;
Takanori Matsumoto, Tokyo, JP;
Tsuruo Nakayama, Tokyo, JP;
Youhei Jikihara, Tokyo, JP;
NBC MESHTEC, INC., Tokyo, JP;
Abstract
A gas treatment device includes a plasma-generating unit and a catalyst medium. The plasma-generating unit is provided with at least a flow channel through which a gas to be treated flows; and a power-supply unit for supplying electrical power, a first electrode, a second electrode and a dielectric material arranged inside the flow channel. A voltage is impressed between the first electrode and the second electrode by the power-supply unit and electrical discharging is caused to occur, whereby plasma is generated. The catalyst medium is adapted for accelerating a reaction with the gas to be treated and is provided in a position where the plasma generated by the plasma-generating unit inside the flow channel is present, and the catalyst medium has metallic catalytic particles present on an inorganic substance.