The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 08, 2018

Filed:

Mar. 11, 2014
Applicant:

Veolia Water Solutions & Technologies Support, Saint-Maurice, FR;

Inventors:

Mark H. Stewart, Raleigh, NC (US);

Luke Wood, Cary, NC (US);

Todd Casey, Apex, NC (US);

Ronald V. Palumbo, Cary, NC (US);

Rune Strube, Rungsted Kyst, DK;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 33/50 (2006.01); B01D 33/80 (2006.01); B01D 33/48 (2006.01);
U.S. Cl.
CPC ...
B01D 33/50 (2013.01); B01D 33/48 (2013.01); B01D 33/804 (2013.01); B01D 2201/084 (2013.01); B01D 2201/085 (2013.01);
Abstract

A rotary disc filter is provided with an integrated backwash and chemical cleaning system. In one mode of operation, backwash is directed through a control valve to one or more nozzles for spraying the backwash onto the filter media forming a part of a rotary disc filter. In a second mode, a chemical cleaning mode, the pump directs backwash through an eductor that induces a chemical into the inductor which is mixed with the backwash to form a backwash-chemical mixture that is sprayed onto the filter media. A control system is used in conjunction with the backwash and cleaning systems to monitor process information and/or filter media properties and to determine when to perform backwashes and regenerative cleanings in order to optimize the performance of the filter system.


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