The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 08, 2018
Filed:
Apr. 29, 2015
Kimberly-clark Worldwide, Inc., Neenah, WI (US);
Andrew T. Baker, Norcross, GA (US);
Elizabeth Deibler Gadsby, Mariette, GA (US);
Russell F. Ross, Atlanta, GA (US);
KIMBERLY-CLARK WORLDWIDE, INC., Neenah, WI (US);
Abstract
The configuration of an elongate aperture in a membrane draped over a microneedle assembly may be controlled by controlling the manner in which the aperture is formed and/or by controlling the manner in which the membrane is draped. At least a portion of the membrane may be spaced apart from a microneedle so that a gap is defined between the membrane and the microneedle. The gap may be configured for at least partially controlling the formation of the elongate aperture. The shape of the gap may optionally be at least partially defined by a pleat in the membrane. Any pleats may be aligned in a predetermined manner. The elongate aperture may be formed by a piercing member that is passed through a hole in the microneedle assembly prior to piercing the membrane. The piercing member may be a laser beam.