The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 01, 2018

Filed:

Jun. 01, 2016
Applicant:

Alfred Kärcher Gmbh & Co. KG, Winnenden, DE;

Inventor:

Alexander Grohmann, Urbach, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G08B 1/08 (2006.01); H04W 4/02 (2018.01); A47L 11/40 (2006.01); G08C 25/04 (2006.01); H04L 29/08 (2006.01);
U.S. Cl.
CPC ...
H04W 4/021 (2013.01); A47L 11/4008 (2013.01); A47L 11/4011 (2013.01); G08C 25/04 (2013.01); A47L 2201/00 (2013.01); G08C 2201/91 (2013.01); H04L 67/125 (2013.01);
Abstract

A method for monitoring an operation location of a surface processing apparatus is provided, wherein a surface processing apparatus is allocated to a spatially delimited operation area by way of an allocating unit, and wherein the position of the surface processing apparatus is established, and it is determined whether the surface processing apparatus is disposed inside or outside the operation area. For versatility, the surface processing apparatus is allocated to a first operation area and at least one second operation area that is spatially separated from the first operation area, and it is determinable whether the surface processing apparatus is disposed outside the first operation area but inside the at least one second operation area. Furthermore, the invention relates to a monitoring system for performing the method.


Find Patent Forward Citations

Loading…