The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 01, 2018

Filed:

Mar. 31, 2014
Applicant:

Shindengen Electric Manufacturing Co., Ltd., Chiyoda-ku, Tokyo, JP;

Inventor:

Nobuki Miyakoshi, Hanno, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/78 (2006.01); H01L 29/06 (2006.01); H01L 29/08 (2006.01); H01L 29/739 (2006.01); H01L 29/40 (2006.01); H01L 29/423 (2006.01); H01L 29/66 (2006.01); H01L 29/778 (2006.01); H01L 21/335 (2006.01); H01L 21/336 (2006.01); H01L 29/10 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7802 (2013.01); H01L 29/0619 (2013.01); H01L 29/0634 (2013.01); H01L 29/0696 (2013.01); H01L 29/086 (2013.01); H01L 29/408 (2013.01); H01L 29/4238 (2013.01); H01L 29/42372 (2013.01); H01L 29/42376 (2013.01); H01L 29/66712 (2013.01); H01L 29/7395 (2013.01); H01L 29/7397 (2013.01); H01L 29/7803 (2013.01); H01L 29/7811 (2013.01); H01L 29/7813 (2013.01); H01L 29/0878 (2013.01); H01L 29/1095 (2013.01); H01L 29/402 (2013.01);
Abstract

In a semiconductor device provided with a MOSFET part and a gate pad part defined on a semiconductor substrate which is formed by laminating a low resistance semiconductor layer and a drift layer, the gate pad part includes: the low resistance semiconductor layer; the drift layer formed on the low resistance semiconductor layer; a poly-silicon layer constituting a conductor layer and a gate pad electrode formed above the drift layer over the whole area of the gate pad part with a field insulation layer interposed therebetween; and a gate oscillation suppressing structure where a p-type diffusion region electrically connected with the a source electrode layer and a p-type impurity non-diffusion region are alternately formed on a surface of the drift layer.


Find Patent Forward Citations

Miyakoshi, Nobuki. (2018). Semiconductor device (U.S. Patent No. 9960267). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9960267

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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