The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 01, 2018
Filed:
Aug. 22, 2016
Applicant:
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Inventors:
Jun-Seok Lee, Suwon-si, KR;
Byoung-Ho Kwon, Hwaseong-si, KR;
Sang-Kyun Kim, Hwaseong-si, KR;
Yun-Jeong Kim, Suwon-si, KR;
Seung-Ho Park, Suwon-si, KR;
Hao Cui, Suwon-si, KR;
In-Seak Hwang, Suwon-si, KR;
Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 27/108 (2006.01); H01L 21/762 (2006.01); H01L 21/3105 (2006.01);
U.S. Cl.
CPC ...
H01L 27/10873 (2013.01); H01L 21/31053 (2013.01); H01L 21/76224 (2013.01);
Abstract
In a method of manufacturing a semiconductor device, mask patterns are formed on a semiconductor substrate. An organic layer is formed on the semiconductor substrate to cover the mask patterns. An upper portion of the organic layer is planarized using a polishing composition. The polishing composition includes an oxidizing agent and is devoid of abrasive particles.