The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 01, 2018
Filed:
Jun. 27, 2014
Hitachi Kokusai Electric Inc., Tokyo, JP;
Junichi Kawasaki, Toyama, JP;
Mitsuru Funakura, Toyama, JP;
HITACHI KOKUSAI ELECTRIC INC., Tokyo, JP;
Abstract
Provided are a substrate processing apparatus, a method of manufacturing a semiconductor device, and a non-transitory computer-readable recording medium, which are capable of reducing an effect on a substrate, which is caused by a change in an atmosphere in a substrate storage container, by appropriately supplying an inert gas into the substrate storage container. The substrate processing apparatus includes a purge mechanism installed in at least one of a support unit and a receiving unit accommodating a substrate storage container, and configured to supply an inert gas into the substrate storage container; a monitoring unit configured to compare a flow rate of the predetermined gas supplied into the substrate storage container via the purge mechanism with a preset reference value and output a signal indicating a result of comparison between the flow rate of the predetermined gas and the preset reference value; and a management unit configured to manage use of the substrate storage container, based on the signal outputted from the monitoring unit.