The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 01, 2018
Filed:
May. 06, 2014
Applied Materials, Inc., Santa Clara, CA (US);
Sandhya Arun, Brookefields, IN;
Prashanth Kodigepalli, Bangalore, IN;
Padma Gopalakrishnan, Fremont, CA (US);
Ashish Bhatnagar, Fremont, CA (US);
Dan Martin, Cupertino, CA (US);
Christopher Heath John Hossack, Gilbert, AZ (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
The present invention generally relates to a ring assembly that may be used in an etching or other plasma processing chamber. The ring assembly generally includes an inner ring body having a top planar surface and a bottom planar surface, and an outer ring body having a top surface, a bottom surface substantially parallel to the top surface, and an inside surface that extends between the top surface and the bottom surface, the inside surface having a roof covering a portion of the inner ring body when the inner ring body is disposed adjacent the roof, wherein the inner ring body can be flipped into a different position so that a portion of the inner ring body that is not covered by the roof provides a substantially planar surface.