The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 01, 2018
Filed:
Nov. 10, 2014
Disney Enterprises, Inc., Burbank, CA (US);
Disney Enterprises, Inc., Burbank, CA (US);
Abstract
A method is disclosed for reducing distortions introduced by deformation of a surface with an existing parameterization. In an exemplary embodiment, the method comprises receiving a rest pose mesh comprising a plurality of faces, a rigidity map corresponding to the rest pose mesh, and a deformed pose mesh; using the rigidity map to generate a simulation grid on the rest pose mesh, the simulation grid comprising a plurality of cells; defining a set of constraints on the simulation grid, the constraints being derived at least in part from the rigidity map; running a simulation using the simulation grid and the set of constraints to obtain a warped grid; and texture mapping the deformed pose mesh based on data from the warped grid.