The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 01, 2018
Filed:
Dec. 21, 2016
Hironori Araki, Milpitas, CA (US);
Yoshitaka Sasaki, Los Gatos, CA (US);
Hiroyuki Ito, Milpitas, CA (US);
Seiichiro Tomita, Milpitas, CA (US);
Shigeki Tanemura, Milpitas, CA (US);
Yukinori Ikegawa, Milpitas, CA (US);
Hironori Araki, Milpitas, CA (US);
Yoshitaka Sasaki, Los Gatos, CA (US);
Hiroyuki Ito, Milpitas, CA (US);
Seiichiro Tomita, Milpitas, CA (US);
Shigeki Tanemura, Milpitas, CA (US);
Yukinori Ikegawa, Milpitas, CA (US);
HEADWAY TECHNOLOGIES, INC., Milpitas, CA (US);
Abstract
A plasmon generator including a wide portion and a narrow portion is manufactured by etching an initial plasmon generator using an etching mask. The etching mask includes a first mask layer for defining the shape of one of the narrow portion and the wide portion, and a second mask layer for defining the shape of the other of the narrow portion and the wide portion. The etching mask is formed by forming a first hard mask, a second initial mask layer and a second hard mask in this order on a first initial mask layer, and etching the first and second initial mask layers by using the first and second hard masks.