The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 01, 2018

Filed:

May. 15, 2014
Applicants:

Robert G. Brown, Tustin, CA (US);

Steven E. Koenck, Cedar Rapids, IA (US);

James E. Melzer, Encinitas, CA (US);

Wyatt L. Hendrick, San Diego, CA (US);

Inventors:

Robert G. Brown, Tustin, CA (US);

Steven E. Koenck, Cedar Rapids, IA (US);

James E. Melzer, Encinitas, CA (US);

Wyatt L. Hendrick, San Diego, CA (US);

Assignee:

Rockwell Collins, Inc., Cedar Rapids, IA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 5/22 (2006.01); G02B 5/20 (2006.01); B82Y 20/00 (2011.01);
U.S. Cl.
CPC ...
G02B 5/206 (2013.01); G02B 5/22 (2013.01); B82Y 20/00 (2013.01); Y10S 977/773 (2013.01); Y10S 977/834 (2013.01);
Abstract

An optical notch filter includes a particle layer including nano-particles in a substrate material. The nano-particles are arranged in one or more arrays to provide a nano plasmonic absorption of radiation having a wavelength of 532 nm incident on the filter. The filter exhibits a radiation absorption profile with an absorption maxima of at least 99% at 532 nm for an angle of incidence of between +50° and −50°, and has a full width half maxima transmission of less than 15 nm.


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