The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 01, 2018

Filed:

Feb. 14, 2017
Applicant:

Industrial Technology Research Institute, Hsin-Chu, TW;

Inventors:

Fu-Ching Tung, Hsinchu, TW;

Ching-Chiun Wang, Miaoli County, TW;

Shih-Hsiang Lai, New Taipei, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/54 (2006.01); C23C 14/54 (2006.01); C23C 14/28 (2006.01); C23C 14/24 (2006.01);
U.S. Cl.
CPC ...
C23C 14/542 (2013.01); C23C 14/24 (2013.01); C23C 14/28 (2013.01);
Abstract

An evaporation method in this disclosure is adapted for performing an evaporation process upon a surface of an evaporation target substrate. In an embodiment, an evaporation source plate is arranged to be heated by a heater so as to evaporate an evaporation material to its gaseous state, and then enable the gaseous evaporation material to travel passing through holes of a shutter device and thus spread toward the surface of the evaporation target substrate for depositing a film. Moreover, the evaporation method uses a transmission device for controlling the opening/closing of the holes, and there is a heating area formed at a position between the shutter device and the evaporation source plate for allowing the evaporation source plate, the plural holes, the heating area, the evaporation material and the heater to be arranged parallel to one another from the top to bottom.


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