The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 01, 2018

Filed:

Sep. 05, 2013
Applicants:

Lg Chem, Ltd., Seoul, KR;

Iucf-hyu (Industry-university Cooperation Foundation Hanyang University), Seoul, KR;

Inventors:

Yang Kyoo Han, Seoul, KR;

Je Gwon Lee, Daejeon, KR;

Hyun Jin Lee, Daejeon, KR;

No Ma Kim, Daejeon, KR;

Sung Soo Yoon, Daejeon, KR;

Eun Ji Shin, Daejeon, KR;

Assignees:

LG CHEM, LTD., Seoul, KR;

IUCF-HYU, Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08J 7/12 (2006.01); H01B 13/00 (2006.01); B05D 5/00 (2006.01); B05D 5/06 (2006.01);
U.S. Cl.
CPC ...
C08J 7/12 (2013.01); H01B 13/003 (2013.01); H01B 13/0016 (2013.01); H01B 13/0026 (2013.01); C08J 2333/26 (2013.01);
Abstract

The present invention relates to a method for forming a metal nanowire or a metal nanomesh. More particularly, the present invention relates to a method for forming a metal nanowire or a metal nanomesh capable of forming a variety of metal nanowires or metal nanomeshes in a desired shape by a simplified method. The method for forming a metal nanowire or a metal nanomesh includes the steps of forming a block copolymer thin film on a substrate, in which the block copolymer thin film includes specific hard segments and soft segments containing one or more polymer repeating units selected from the group consisting of a poly(meth)acrylate-based repeating unit, a polyalkylene oxide-based repeating unit, a polyvinylpyridine-based repeating unit, a polystyrene-based repeating unit, a polydiene-based repeating unit and a polylactone-based repeating unit; conducting orientation of the hard segments and soft segments in a lamellar or cylindrical form in the block copolymer thin film; selectively removing the soft segments; adsorbing a metal precursor onto the hard segments; and removing the hard segments.


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