The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 01, 2018
Filed:
Feb. 27, 2014
Applicants:
Kyushu University, National University Corporation, Fukuoka-shi, Fukuoka, JP;
Fujibo Holdings, Inc., Chuo-ku, Tokyo, JP;
Inventors:
Toshiro Doi, Fukuoka, JP;
Kiyoshi Seshimo, Fukuoka, JP;
Masataka Takagi, Saijo, JP;
Hiroshi Kashiwada, Saijo, JP;
Assignees:
KYUSHU UNIVERSITY, NATIONAL UNIVERSITY CORPORATION, Fukuoka-shi, Fukuoka, JP;
FUJIBO HOLDINGS, INC., Chuo-ku, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24D 13/00 (2006.01); B24B 37/24 (2012.01); B24B 37/22 (2012.01); B24D 11/00 (2006.01);
U.S. Cl.
CPC ...
B24D 13/00 (2013.01); B24B 37/22 (2013.01); B24B 37/24 (2013.01); B24D 11/00 (2013.01);
Abstract
The present invention provides a polishing pad including a polishing member having a polishing surface, wherein the polishing member contains a material having dilatancy characteristics.
Doi, Toshiro. (2018). Polishing pad and polishing method (U.S. Patent No. 9956669). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9956669
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile