The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 24, 2018
Filed:
Jan. 29, 2016
Shenzhen China Star Optoelectronics Technology Co., Ltd., Shenzhen, CN;
Yawei Liu, Shenzhen, CN;
Tsungyuan Wu, Shenzhen, CN;
SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD., Shenzhen, Guangdong, CN;
Abstract
The invention provides a recess structure for print deposition process and manufacturing method thereof. By disposing the dam () enclosing the recess () as comprising at least two stacked branch dam layers, and increasing the contact angle between the inclined inner circumferential surface of recess () enclosed by the branch dam layers and ink in a layer-by-layer manner, to limit height the ink able to climb on the inclined inner circumferential surface of the recess (), the invention can improve the thickness uniformity of the organic functional layers printed in the recess and the photoelectric properties of organic functional layers. The recess () fabricated by the manufacturing method can limit height the ink able to climb on inclined inner circumferential surface of the recess () to improve the thickness uniformity of the organic functional layers printed in the recess and the photoelectric properties of organic functional layers.