The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 24, 2018

Filed:

Sep. 22, 2017
Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventors:

Hiroaki Takao, Saitama, JP;

Takeshi Misawa, Saitama, JP;

Takeshi Kamiya, Saitama, JP;

Tomonori Masuda, Saitama, JP;

Koudai Fujita, Saitama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/521 (2017.01); G01S 7/493 (2006.01); G01S 17/89 (2006.01); G01S 17/08 (2006.01);
U.S. Cl.
CPC ...
G06T 7/521 (2017.01); G01S 7/493 (2013.01); G01S 17/89 (2013.01); G01S 17/08 (2013.01);
Abstract

A distance image acquisition apparatus includes a projection unit which projects a first pattern of structured light in a plurality of wavelength bandwidths, an imaging unit which is provided in parallel with and apart from the projection unit by a baseline length, performs imaging with sensitivities to a plurality of wavelength bandwidths, and generates a plurality of captured images corresponding to a plurality of wavelength bandwidths, a determination unit which determines whether or not a second pattern of structured light projected from another distance image acquisition apparatus is included in the captured images, and a pattern extraction unit which extracts the first pattern from a captured image determined as the second pattern being not included by the determination unit, and a distance image acquisition unit which acquires a distance image indicating a distance of a subject within a distance measurement region based on the first pattern.


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