The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 24, 2018

Filed:

Feb. 23, 2015
Applicant:

Samsung Display Co. Ltd., Yongin, KR;

Inventors:

Min Hyuck Kang, Seoul, KR;

Eun Ae Kwak, Gunpo-si, KR;

Lei Xie, Suwon-si, KR;

Moon Gyu Lee, Suwon-si, KR;

Hyeong Gyu Jang, Busan, KR;

Assignee:

SAMSUNG DISPLAY CO. LTD., Gyeonggi-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G02B 5/30 (2006.01);
U.S. Cl.
CPC ...
G02B 5/3058 (2013.01); G03F 7/0002 (2013.01);
Abstract

A patterning method includes forming guide layer patterns, which are separated from each other, on a top surface of a base substrate, forming a neutral layer, which includes a random copolymer comprising first blocks or second blocks, on an entirety of the top surface of the base substrate exposed between the guide layer patterns, forming hydrophobic layer patterns which extend from top surfaces of the guide layer patterns to side surfaces of the guide layer patterns and are separated from each other, coating a block copolymer, which comprises the first blocks and the second blocks, on a top surface of the neutral layer exposed between the hydrophobic layer patterns, alternately arranging the first blocks and the second blocks by heat-treating or solvent-annealing the block copolymer, and forming block copolymer patterns by removing the first blocks or the second blocks.


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