The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 24, 2018
Filed:
Jul. 12, 2016
Olympus Corporation, Hachioji-shi, Tokyo, JP;
Kanato Adachi, Kawasaki, JP;
OLYMPUS CORPORATION, Tokyo, JP;
Abstract
According to one aspect, an eccentricity amount obtainment method is a method of obtaining shift eccentricity amounts of lens frames through in a lens barrel that includes the plurality of lens frames having lens cells, the eccentricity amount obtainment method including arranging, in each of the lens cells, a flat plate member on which an index is formed and which has optical transparency and arranging the lens frames in the lens barrel in a prescribed order so as to assemble an assembly, a emitting illumination light to the flat plate members, obtaining pieces of information related to positions of the indexes formed on the flat plate members, and obtaining, as the shift eccentricity amounts of the lens frames, the positional displacement amounts with respect to the indexes formed on the flat plate members with respect to an arbitrary position.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile