The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 24, 2018
Filed:
Dec. 11, 2014
Dic Corporation, Tokyo, JP;
Tetsuo Takada, Sakura, JP;
DIC Corporation, Tokyo, JP;
Abstract
Provided is a cell culture substrate, in which polymer (B) having a lower critical solution temperature contained in the substrate is a copolymer of a monomer (a) that becomes a hydrophobic polymer in homopolymerization and a monomer (b, c or d) that becomes a hydrophilic polymer in homopolymerization, which is uncrosslinked, and the lower critical solution temperature of the obtained copolymer (B) can be controlled widely by the types and ratio of the two monomers, to easily detach the cultured cells from the culture substrate surface rapidly without using protein hydrolase and collect the cells without damage. This cell culture substrate contains a polymer (A) of a (meth)acrylic acid ester monomer (a), one or more types of inorganic materials (C) selected from a water-swellable clay mineral and silica, and a polymer (B) having a lower critical solution temperature and including a monomer (a) and a monomer (b, c or d).