The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 24, 2018

Filed:

Dec. 24, 2014
Applicant:

Lg Chem, Ltd., Seoul, KR;

Inventors:

Kwang Hyun Yoo, Daejeon, KR;

Kwon Nam Sohn, Daejeon, KR;

Won Jong Kwon, Daejeon, KR;

Kil Sun Lee, Daejeon, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01B 31/04 (2006.01); C01B 32/184 (2017.01); C01B 32/19 (2017.01); C01B 32/194 (2017.01);
U.S. Cl.
CPC ...
C01B 31/0446 (2013.01); C01B 32/184 (2017.08); C01B 32/19 (2017.08); C01B 32/194 (2017.08); C01B 2204/00 (2013.01); C01P 2002/82 (2013.01); C01P 2002/85 (2013.01); C01P 2002/86 (2013.01); C01P 2002/89 (2013.01); C01P 2004/03 (2013.01); C01P 2004/04 (2013.01); C01P 2004/24 (2013.01);
Abstract

Disclosed herein is a preparation method of graphene, capable of preparing graphene having a smaller thickness and a large area, and with reduced defect generation, by a simplified process. The preparation method of graphene includes forming dispersion including a carbon-based material including unoxidized graphite, and a dispersant; and continuously passing the dispersion through a high pressure homogenizer including an inlet, an outlet, and a micro-channel for connection between the inlet and the outlet, having a diameter in a micrometer scale, wherein the carbon-based material is exfoliated, as the material is passed through the micro-channel under application of a shear force, thereby forming graphene having a thickness in nanoscale.


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