The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 17, 2018

Filed:

Oct. 21, 2014
Applicant:

Nikon Corporation, Chiyoda-ku, Tokyo, JP;

Inventors:

Alton H. Phillips, East Palo Alto, CA (US);

Fardad A. Hashemi, Moraga, CA (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B32B 37/10 (2006.01); H01L 23/00 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 24/83 (2013.01); B32B 37/10 (2013.01); H01L 21/67092 (2013.01); B32B 2037/1063 (2013.01); B32B 2457/14 (2013.01); H01L 2224/8312 (2013.01); H01L 2224/83203 (2013.01); H01L 2924/01322 (2013.01); H01L 2924/15787 (2013.01);
Abstract

A system and method for clamping wafers together in alignment using pressure. The system and method involves holding a first wafer and a second wafer together in alignment using a wafer clamp within an ambient environment maintained at a first pressure and creating a second pressure at least partially around and between the first wafer and the second wafer held together by the wafer clamp, wherein the first pressure is greater than the second pressure. The first wafer and the second wafer are clamped together in alignment using a pneumatic force created by a pressure differential between the first pressure and the second pressure.


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