The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2018
Filed:
Oct. 01, 2015
Nissin Electric Co., Ltd., Kyoto, JP;
Yasunori Ando, Kyoto, JP;
Dongwei Li, Kyoto, JP;
NISSIN ELECTRIC CO., LTD., Kyoto, JP;
Abstract
Provided are an antenna, which is disposed in a vacuum chamber for generating an inductively coupled plasma, and a plasma processing device. The antenna and the plasma processing device suppress increase of the impedance even if the antenna is lengthened. An antennais disposed in a vacuum chamberfor generating an inductively coupled plasmain the vacuum chamberby applying a high frequency current. The antennaincludes an insulating pipeand a hollow antenna bodywhich is disposed in the insulating pipeand in which cooling water flows. The antenna bodyhas a structure that a plurality of metal pipesare connected in series with a hollow insulatorinterposed between the adjacent metal pipes, and each connecting portion has a sealing function with respect to vacuum and the cooling water.