The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 17, 2018

Filed:

Mar. 31, 2014
Applicant:

Emc Corporation, Hopkinton, MA (US);

Inventors:

Sourav Ghosh, Sammamish, WA (US);

Jeffrey Tremaine, Seattle, WA (US);

Matthew Fleming, Santa Clara, CA (US);

Eric M. Lemar, Seattle, WA (US);

Mayank Rajawat, Issaquah, WA (US);

Harsha Mahuli, Sammamish, WA (US);

Assignee:

EMC IP Holding Company LLC, Hopkinton, MA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 7/00 (2006.01); G06F 17/00 (2006.01); G06F 17/30 (2006.01);
U.S. Cl.
CPC ...
G06F 17/30156 (2013.01);
Abstract

Implementations are provided herein for data deduplication, and more particularly, to post-process data deduplication on a large scale out storage system. Multiple techniques and implementations are disclosed that offer greater efficiency, higher performance, and more stability when performing post-process data deduplication at large scale. Disclosed implementations are based on a process for data deduplication involving four main phases: enumeration, commonality, sharing, and update. Multi-level hashing can be used to identify candidates for deduplication during the enumeration phase, providing a more efficient use of compute resources. In addition, datasets can be phase rotated through the post-process deduplication steps providing a more controllable deduplication environment as well as a more efficient use of resources.


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