The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2018
Filed:
Nov. 28, 2014
Interface Optoelectronics Corporation, Shenzhen, CN;
General Interface Solution Limited, Miaoli County, TW;
Giing-Lii Chen, New Taipei, TW;
INTERFACE OPTOELECTRONICS CORPORATION, Shenzhen, CN;
GENERAL INTERFACE SOLUTION LIMITED, Miaoli County, TW;
Abstract
A method for forming a metal mesh pattern is provided. The method includes the operations below. First, at least one pitch of each of mesh base units of a mesh base is determined, and thereby the mesh base is formed. Then, a seed region is set in each of the mesh base units of the mesh base, in which a ratio of an area of each of the seed regions to an area of each of the mesh base units is a constant. Then, a plurality of seeds are generated by randomly selecting a point in each of the seed regions. Finally, the metal mesh pattern is formed, in which the metal mesh pattern is a set of perpendicular bisectors of lines connecting the seeds and their adjacent neighboring seeds.