The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2018
Filed:
Oct. 17, 2013
Applicant:
Nikon Corporation, Tokyo, JP;
Inventor:
Yoji Watanabe, Kumagaya, JP;
Assignee:
NIKON CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/00 (2006.01); G03F 7/20 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70 (2013.01); G03F 7/0035 (2013.01); G03F 7/70466 (2013.01);
Abstract
A pattern forming method which includes: forming a plurality of first line patterns of which longitudinal direction is a first direction and a plurality of second line patterns of which longitudinal direction is the first direction and of which etching characteristic is different from etching characteristic of the plurality of first line patterns, so that at least one edge portion of each of the plurality of first line patterns and at least one edge portion of each of the plurality of second line patterns are adjacent to each other; and removing at least a portion of the plurality of first line patterns by etching.