The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 17, 2018

Filed:

Mar. 04, 2015
Applicant:

Philips Lighting Holding B.v., Eindhoven, NL;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F21V 1/00 (2006.01); G02B 19/00 (2006.01); G02B 5/04 (2006.01); F21V 5/00 (2018.01); F21V 5/04 (2006.01); G02B 3/00 (2006.01); G02B 3/08 (2006.01); F21V 7/00 (2006.01); F21Y 105/10 (2016.01); F21Y 115/10 (2016.01); F21Y 105/18 (2016.01);
U.S. Cl.
CPC ...
G02B 19/0028 (2013.01); F21V 5/007 (2013.01); F21V 5/045 (2013.01); F21V 7/0091 (2013.01); G02B 3/0056 (2013.01); G02B 3/08 (2013.01); G02B 5/045 (2013.01); G02B 19/0066 (2013.01); F21Y 2105/10 (2016.08); F21Y 2105/18 (2016.08); F21Y 2115/10 (2016.08);
Abstract

A beam shaping system is for example for use over an array of light sources. An array of beam shaping units is arranged in a general plane, each beam shaping unit comprising a central refracting area, an intermediate total internal reflection area for processing of light from a light source beneath the central area, and an outer total internal reflection area for processing light from the nearest light source and an adjacent light source. This outer area essentially extends the useful size of the adjacent beam shaping unit to improve the beam shaping performance and/or the optical efficiency.


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