The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2018
Filed:
Oct. 02, 2014
Schlumberger Technology Corporation, Sugar Land, TX (US);
Keli Sun, Sugar Land, TX (US);
Roger Griffiths, Selangor, MY;
Steve Crary, Al-Khobar, SA;
Christopher Morriss, Sugar Land, TX (US);
Koji Ito, Sugar Land, TX (US);
SCHLUMBERGER TECHNOLOGY CORPORATION, Sugar Land, TX (US);
Abstract
Embodiments set forth in this disclosure providing techniques for determining formation parameters, such as horizontal resistivity (Rh), vertical resistivity (Rv), and dip, in high angle and horizontal wells using non-directional resistivity measurements. For example, a method is provided that may include using an electromagnetic logging tool to acquire non-directional resistivity measurements in a wellbore of a high angle or horizontal well. The method may also include defining a processing window that corresponds to a measurement point of the electromagnetic logging tool along a well trajectory that intersects a at least one bed boundary between two layers of a subsurface formation. The method may also include defining a formation structure and defining an initial set of formation parameters for each layer in the formation structure. Furthermore, the method may include inverting the formation parameters for each layer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile