The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 17, 2018

Filed:

Dec. 08, 2011
Applicant:

John Macneil, Vale of Glamorgan, GB;

Inventor:

John Macneil, Vale of Glamorgan, GB;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25D 5/02 (2006.01); C25D 5/08 (2006.01); C25D 5/18 (2006.01); C25D 7/12 (2006.01); C25D 17/00 (2006.01); C25D 17/02 (2006.01); C25D 21/02 (2006.01); C25D 21/18 (2006.01);
U.S. Cl.
CPC ...
C25D 17/001 (2013.01); C25D 5/022 (2013.01); C25D 5/08 (2013.01); C25D 7/123 (2013.01); C25D 17/004 (2013.01); C25D 17/02 (2013.01); C25D 21/02 (2013.01); C25D 21/18 (2013.01); C25D 5/18 (2013.01);
Abstract

This invention relates to apparatus for electrochemical deposition onto the surface of a substrate. The apparatus includes an anode electrodea supportfor supporting the substratewith its one surfaceexposed at a location, the supportand the anode electrodebeing relatively movable to alter the gap between the anodeand the location to define a chamberbetween them and an electrical power sourcewith an ohmic contact to the seed layerfor creating a potential difference across the gap. The apparatus further includes a sealfor sealing with the seed layerto define the fluid chamber; and the fluid inletand a fluid outletto the chamber


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