The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 17, 2018

Filed:

Sep. 24, 2010
Applicants:

Jürgen Ramm, Maienfeld, CH;

Beno Widrig, Bad Ragaz, CH;

Inventors:

Jürgen Ramm, Maienfeld, CH;

Beno Widrig, Bad Ragaz, CH;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/00 (2006.01); C23C 14/24 (2006.01); C23C 14/06 (2006.01); C23C 14/08 (2006.01); C23C 14/32 (2006.01); C23C 14/34 (2006.01);
U.S. Cl.
CPC ...
C23C 14/24 (2013.01); C23C 14/0021 (2013.01); C23C 14/0676 (2013.01); C23C 14/083 (2013.01); C23C 14/325 (2013.01); C23C 14/0036 (2013.01); C23C 14/0042 (2013.01); C23C 14/3485 (2013.01);
Abstract

In order to produce zirconia-based layers on a deposition substrate, wherein reactive spark deposition using pulsed spark current and/or the application of a magnetic field that is perpendicular to the spark target are employed, a mixed target comprising elemental zircon and at least one stabilizer is used, or a zirconium target comprising elemental zirconium is used, wherein in addition to oxygen, nitrogen is used as the reactive gas. As an alternative, combined with the use of the mixed target, nitrogen can also be used as the reactive gas in addition to oxygen.


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