The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 17, 2018

Filed:

Mar. 26, 2015
Applicant:

H.c. Starck, Inc., Newton, MA (US);

Inventors:

Gary Alan Rozak, Akron, OH (US);

Mark E. Gaydos, Nashua, NH (US);

Patrick Alan Hogan, Somerville, MA (US);

Shuwei Sun, Framingham, MA (US);

Assignee:

H.C. STARCK, INC., Newton, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B22F 7/04 (2006.01); G06F 1/16 (2006.01); C23C 14/18 (2006.01); C22C 1/04 (2006.01); C22C 27/04 (2006.01); C23C 14/34 (2006.01); C23C 14/58 (2006.01); G06F 3/041 (2006.01);
U.S. Cl.
CPC ...
C23C 14/185 (2013.01); C22C 1/045 (2013.01); C22C 27/04 (2013.01); C23C 14/3407 (2013.01); C23C 14/3414 (2013.01); C23C 14/5873 (2013.01); G06F 3/041 (2013.01); B22F 2998/10 (2013.01); G06F 2203/04103 (2013.01); Y10T 428/12743 (2015.01); Y10T 428/12826 (2015.01); Y10T 428/265 (2015.01); Y10T 428/31678 (2015.04);
Abstract

The invention is directed at sputter targets including 50 atomic % or more molybdenum, a second metal element of niobium or vanadium, and a third metal element selected from the group consisting of titanium, chromium, niobium, vanadium, and tantalum, wherein the third metal element is different from the second metal element, and deposited films prepared by the sputter targets. In a preferred aspect of the invention, the sputter target includes a phase that is rich in molybdenum, a phase that is rich in the second metal element, and a phase that is rich in the third metal element.


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