The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 10, 2018
Filed:
Nov. 01, 2016
Applicant:
Spawar Systems Center Pacific, San Diego, CA (US);
Inventors:
Joanna N. Ptasinski, San Diego, CA (US);
Stephen D. Russell, San Diego, CA (US);
Assignee:
The United States of America as represented by Secretary of the Navy, Washington, DC (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/306 (2006.01); H01L 21/308 (2006.01); H01L 21/02 (2006.01); H01L 23/373 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
H01L 21/3081 (2013.01); H01L 21/0273 (2013.01); H01L 21/02118 (2013.01); H01L 21/30604 (2013.01); H01L 23/3737 (2013.01);
Abstract
A method is provided for creating a chamber on a semiconductor substrate, utilizing wet etching or dry etching, back-filling the chamber with a polymeric compound, and sealing the chamber.