The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 10, 2018

Filed:

Nov. 17, 2016
Applicant:

Western Digital Technologies, Inc., Irvine, CA (US);

Inventor:

Kai Tang, San Jose, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/708 (2006.01); G11B 5/84 (2006.01); G11B 5/712 (2006.01); G11B 5/72 (2006.01); G11B 5/65 (2006.01); C23C 14/48 (2006.01); G11B 5/82 (2006.01);
U.S. Cl.
CPC ...
G11B 5/708 (2013.01); C23C 14/48 (2013.01); G11B 5/65 (2013.01); G11B 5/712 (2013.01); G11B 5/72 (2013.01); G11B 5/84 (2013.01); G11B 5/8408 (2013.01); G11B 5/82 (2013.01);
Abstract

A method for manufacturing a magnetic media for magnetic data recording that improves smoothness for reduced magnetic spacing, and also improves mechanical integration to improve reliability and lifespan of the data recording system. A magnetic material such as a magnetic recording layer is deposited over underlying layers that include a substrate. A first etching is performed that employs a Xe plasma. A second etching is then performed that employs an Ar plasma. The two step etching process advantageously improves smoothness of the surface of the magnetic layer which allows for a thinner overcoat for reduced magnetic spacing. The two step etching process also results in less head disk crashes, resulting in improved reliability.


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