The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 10, 2018

Filed:

Aug. 26, 2016
Applicant:

Multimedia Image Solution Limited, Dublin, IE;

Inventors:

Hua Lei, Hangzhou, CN;

Jin Wang, Hangzhou, CN;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06T 3/40 (2006.01); G06T 5/50 (2006.01); G06T 7/00 (2017.01); G06T 3/00 (2006.01);
U.S. Cl.
CPC ...
G06T 3/4038 (2013.01); G06T 3/0068 (2013.01); G06T 5/50 (2013.01); G06T 7/003 (2013.01); G06T 2207/10004 (2013.01); G06T 2207/20221 (2013.01); G06T 2207/30201 (2013.01);
Abstract

The present invention is to provide a method for ensuring perfect stitching of a subject's images in a real-site image stitching operation, which enables an electronic device to read two real-site images which are taken respectively of different parts of the same site and each of which has an overlap area of a common subject; to determine and choose an optimal stitching path bypassing the subject; to construct a mask diagram such that, within a difference diagram of the overlap areas, the farther a pixel on one side of the optimal stitching path is from the optimal stitching path, the greater the pixel's value, and the farther a pixel on the other side of the optimal stitching path is from the optimal stitching path, the smaller the pixel's value; and to stitch and fuse the overlap areas together through a fusion algorithm, with the mask diagram serving as a weight.


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