The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 10, 2018
Filed:
Dec. 03, 2014
Canon Kabushiki Kaisha, Tokyo, JP;
Hironori Maeda, Utsunomiya, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
The present invention provides a lithography apparatus including a sensor configured to detect each of an image of a first mark on a first surface of a substrate and a second mark on a second surface opposite to the first surface, and a processor configured to perform processing of deciding a measurement focus position at which the sensor can detect both the image of the first mark and the image of the second mark based on first mark detection information obtained in a focus state of the optical system in which the sensor can detect the image of the first mark, and second mark detection information obtained in a focus state in which the sensor can detect the image of the second mark.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile