The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 10, 2018
Filed:
Feb. 11, 2014
Applicant:
E-vision, Llc, Sarasota, FL (US);
Inventors:
Anita Trajkovska-Broach, Christiansburg, VA (US);
David Boyd, Roanoke, VA (US);
Dan Chambers, Roanoke, VA (US);
Joseph O. Branham, Lexington, VA (US);
Assignee:
e-Vision, LLC, Sarasota, FL (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/133 (2006.01); G02F 1/1337 (2006.01);
U.S. Cl.
CPC ...
G02F 1/13378 (2013.01); G02F 1/133753 (2013.01); G02F 1/133788 (2013.01); G02F 2001/133796 (2013.01); Y10T 29/49147 (2015.01);
Abstract
Methods are provided for making layers with nano- and micro-patterned topographies by laser action or inkjet printing on a first surface. These topographies have a periodicity of 5 nm to 500 μm in a first direction in the plane of the first surface. These layers can be used as anisotropically patterned alignment layers in electro-optical devices and generate an orientational order of at least 0.30.