The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 10, 2018
Filed:
Sep. 28, 2015
Applicant:
United Technologies Corporation, Hartford, CT (US);
Inventors:
Iuliana Cernatescu, Glastonbury, CT (US);
David U. Furrer, Marlborough, CT (US);
Venkatarama K. Seetharaman, Rocky Hill, CT (US);
Assignee:
United Technologies Corporation, Farmington, CT (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/20 (2006.01); G01N 23/18 (2018.01); G01N 23/087 (2018.01); G01N 23/06 (2018.01); G01N 23/12 (2018.01); G01N 23/08 (2006.01); G01N 23/083 (2018.01);
U.S. Cl.
CPC ...
G01N 23/20 (2013.01); G01N 23/06 (2013.01); G01N 23/08 (2013.01); G01N 23/083 (2013.01); G01N 23/087 (2013.01); G01N 23/12 (2013.01); G01N 23/18 (2013.01); G01N 23/20016 (2013.01); G01N 23/20025 (2013.01); G01N 2223/316 (2013.01); G01N 2223/61 (2013.01); G01N 2223/6116 (2013.01); G01N 2223/63 (2013.01); G01N 2223/6466 (2013.01);
Abstract
Aspects of the disclosure are directed to an analysis of a material of a component. A radiation source is activated to transmit radiation to the component. A beam pattern is obtained based on the component interfering with the radiation. The beam pattern is compared to a reference beam pattern. An anomaly is detected to exist in the material when the comparison indicates a deviation between the beam pattern and the reference beam pattern.