The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 10, 2018

Filed:

Jul. 10, 2015
Applicant:

Apple Inc., Cupertino, CA (US);

Inventors:

Yoji Hamada, Tokyo-to, JP;

Matthew D. Rohrbach, Cupertino, CA (US);

Daniel A. Podhajny, Cupertino, CA (US);

Ying-Liang Su, Shenzhen, CN;

Douglas J. Weber, San Francisco, CA (US);

Benjamin A. Shaffer, Cupertino, CA (US);

Motohide Hatanaka, Tokyo-to, JP;

Assignee:

APPLE INC., Cupertino, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
D03D 47/34 (2006.01); D03D 3/00 (2006.01); D03D 13/00 (2006.01); D03D 15/08 (2006.01); D03D 49/04 (2006.01); A44C 5/00 (2006.01);
U.S. Cl.
CPC ...
D03D 47/347 (2013.01); D03D 3/005 (2013.01); D03D 13/00 (2013.01); D03D 15/08 (2013.01); D03D 49/04 (2013.01); A44C 5/0053 (2013.01); A44C 5/0069 (2013.01);
Abstract

A wearable band includes a woven material having two or more stretch regions. The different stretch regions can be formed by varying the tension on subsets of the warp threads, the weft threads, or both the warp and weft threads. A system for producing the woven material can include two or more tension control devices operably connected to a processing device. Each tension control device is configured to adjust the amount of tension in a respective subset of threads (e.g., warp threads) in the woven material during a weaving operation. The processing device is configured to select thread tension patterns for the subsets of threads used during the weaving operation. Each thread tension pattern includes tension settings for the subsets of threads, where at least one tension setting in one thread tension pattern differs from the tension settings in the other tension patterns.


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