The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 10, 2018
Filed:
Sep. 09, 2016
Applicant:
Toshiba Memory Corporation, Tokyo, JP;
Inventors:
Assignee:
Toshiba Memory Corporation, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
B24B 37/04 (2012.01); B24B 37/10 (2012.01); B24B 53/007 (2006.01); B24B 1/00 (2006.01);
U.S. Cl.
CPC ...
B24B 53/007 (2013.01); B24B 1/00 (2013.01); B24B 37/04 (2013.01); B24B 37/042 (2013.01); B24B 37/044 (2013.01); B24B 37/10 (2013.01);
Abstract
In a substrate processing method according to an embodiment, a surface of an object to be polished disposed on a substrate is polished on a polishing pad supplied with slurry. After the polishing process using the slurry, the surface of the object to be polished on the polishing pad is polished, while supplying water on the polishing pad where a residue including the slurry or a sludge of the polishing pad adhered. After the polishing process using the water, the surface of the object to be polished is cleaned on the polishing pad by supplying rinse liquid on the polishing pad.