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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9937602 B1

PDFFull Text
Date of Patent:
Apr. 10, 2018

Filed:

Sep. 09, 2016

Substrate processing method

Applicant:

Toshiba Memory Corporation, Tokyo, JP;

Inventors:

Yosuke Otsuka, Mie, JP;

Masako Kodera, Kanagawa, JP;

Yukiteru Matsui, Aichi, JP;

Assignee:

Toshiba Memory Corporation, Tokyo, JP;

Attorney:

Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.

Primary Examiner:

Eileen Morgan

Int. Cl.
CPC ...
B24B 37/04 (2012.01); B24B 37/10 (2012.01); B24B 53/007 (2006.01); B24B 1/00 (2006.01);
U.S. Cl.
CPC ...
B24B 53/007 (2013.01); B24B 1/00 (2013.01); B24B 37/04 (2013.01); B24B 37/042 (2013.01); B24B 37/044 (2013.01); B24B 37/10 (2013.01);
Abstract

In a substrate processing method according to an embodiment, a surface of an object to be polished disposed on a substrate is polished on a polishing pad supplied with slurry. After the polishing process using the slurry, the surface of the object to be polished on the polishing pad is polished, while supplying water on the polishing pad where a residue including the slurry or a sludge of the polishing pad adhered. After the polishing process using the water, the surface of the object to be polished is cleaned on the polishing pad by supplying rinse liquid on the polishing pad.

Find Patent Forward Citations

Otsuka, Yosuke. (2018). Substrate processing method (U.S. Patent No. 9937602). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9937602

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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