The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 03, 2018

Filed:

Jun. 05, 2015
Applicants:

Boe Technology Group Co., Ltd., Beijing, CN;

Hefei Boe Optoelectronics Technology Co., Ltd., Hefei, Anhui, CN;

Inventors:

Xiaokun Wang, Beijing, CN;

Sangsoo Park, Beijing, CN;

Xunze Zhang, Beijing, CN;

Zhaobo Wang, Beijing, CN;

Lei Sha, Beijing, CN;

Guanjie Cheng, Beijing, CN;

Wenjun Zhang, Beijing, CN;

Hualu Wang, Beijing, CN;

Qingliang Wen, Beijing, CN;

Leilei Lv, Beijing, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/00 (2006.01); H01J 37/34 (2006.01); C23C 14/34 (2006.01); C23C 14/35 (2006.01); C23C 14/50 (2006.01); C23C 14/56 (2006.01); C23C 14/08 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3417 (2013.01); C23C 14/3407 (2013.01); C23C 14/352 (2013.01); C23C 14/505 (2013.01); C23C 14/562 (2013.01); H01J 37/3447 (2013.01); H01J 37/3473 (2013.01); H01J 37/3488 (2013.01); C23C 14/086 (2013.01);
Abstract

It is provided a magnetron-sputtering coating system including a sputtering chamber. The sputtering chamber therein includes: a set of target, formed by concatenating a plurality pieces of target; a substrate carrier, arranged to be opposite to the target set, and support a substrate to be coated with a film; and a driving device, arranged to drive the substrate carrier to reciprocate in a direction of the arrangement of the target.


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