The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 03, 2018
Filed:
Jul. 14, 2016
Applicant:
Kabushiki Kaisha Toshiba, Tokyo, JP;
Inventors:
Assignee:
Kabushiki Kaisha Toshiba, Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01J 9/18 (2006.01); A61L 9/22 (2006.01); H05H 1/24 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32541 (2013.01); A61L 9/22 (2013.01); H01J 9/18 (2013.01); H01J 37/32348 (2013.01); H01J 37/32844 (2013.01); H05H 1/2406 (2013.01); H05H 2001/2412 (2013.01); H05H 2001/2418 (2013.01); H05H 2001/2437 (2013.01); Y02C 20/30 (2013.01);
Abstract
In one embodiment, a plasma induced flow electrode structure has an electrode block, an insulating layer and an electrode layer. The electrode block has first and second surfaces and through holes penetrating between these first and second surfaces. The insulating layer is disposed on the first surface and inside the through holes. The electrode layer is disposed on the insulating layer of the first surface.