The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 03, 2018
Filed:
Jan. 10, 2017
Applicant:
Seagate Technology Llc, Cupertino, CA (US);
Inventors:
Shuaigang Xiao, Fremont, CA (US);
David S. Kuo, Palo Alto, CA (US);
XiaoMin Yang, Livermore, CA (US);
Kim Y. Lee, Fremont, CA (US);
Yautzong Hsu, Fremont, CA (US);
Koichi Wago, Sunnyvale, CA (US);
Assignee:
Seagate Technology LLC, Cupertino, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/596 (2006.01); G11B 20/12 (2006.01);
U.S. Cl.
CPC ...
G11B 5/59638 (2013.01); G11B 20/1217 (2013.01); G11B 2020/1281 (2013.01);
Abstract
Provided herein is a method, including creating a first pattern in a data region of a substrate, and creating a second pattern in a servo region of a substrate. A circumferential line pattern is created overlapping the first pattern to create rectangle-shaped protrusions in the data region of the substrate. A chevron pattern is created overlapping the second pattern to create chevron-derived protrusions in the servo region of the substrate.